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Course number and title: EE222 Integrated Circuits Fabrication Processes
Credits: 4
Instructor(s)-in-charge: Not offered in 2011-12
Course type: Lecture
Required or Elective: Elective
Course Schedule:
Lecture: 4 hrs/week
Outside Study: 8 hrs/week
 
Course Assessment:
Homework: Several assignments
Exams: 1 midterm and 1 final
 
Grading Policy: Typically, 20% homework, 30% midterm, 50% final
Course Prerequisites: EE2
Catalog Description: Principles of integrated circuits fabrication processes. Technological limitations of integrated circuits design. Topics include bulk crystal and epitaxial growth, thermal oxidation, diffusion, ion-implantation, chemical vapor deposition, dry etching, lithography, and metallization. Introduction of advanced process simulation tools.  
Course Website
Topics covered in the course:
Principles of integrated circuits fabrication processes
Technological limitations of integrated circuits design
Bulk crystal and epitaxial growth
Thermal oxidation, diffusion, ion-implantation, chemical vapor deposition
Dry etching, lithography, and metallization
Advanced process simulation tools
Will this course involve computer assignments? NO Will this course have TA(s) when it is offered? NO

:: Last modified: September 2011 by C. Chiuco ::

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